Thin Films Technology. Lecture 3: Physical Vapor Deposition PVD. Jari Koskinen. Aalto University. Page 1

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Transkriptio:

Thin Films Technology Lecture 3: Physical Vapor Deposition PVD Jari Koskinen Aalto University Page 1

Contents Plasma Ion surface interactions Film growth mechanisms Different PVD methods Commercial PVD coatings Scale up 2

Contents Plasma Ion surface interactions Film growth mechanisms Different PVD methods Commercial PVD coatings Scale up 3

PVD Plasma Plasma Colliding electrons ionise atoms Ions and electrons accelerate in electric field collisions excite atoms de-excitation creates photons visible light 4

Glow discharge http://astro-canada.ca

Glow discharge

Glow discharge

Glow discharge

Glow discharge

Glow discharge

Glow discharge

Glow discharge

DC Plasma glow discharge and arc 13

RF Plasma glow discharge 14 http://www.spectruma.de

RF Plasma glow discharge self bias 15 M. Ohring

Self bias at electrodes 4 Sivu 16

Energetic ion surface interactions 17

PVD coating process (High) vacuum long mean free path of ions high ion energy cleaning of surface desorption of gas sputtering of surface removal of oils water oxides 18

Average mean free path (distance between collission) in nitrogen residual gas <λ> Ultra Good High High Intermediate Rough Total pressure of residual gasses

Contents Plasma Ion surface interactions Film growth mechanisms Different PVD methods Commercial PVD coatings Scale up 20

Source materials Coating material from solid target or gas http://sunnygreater.com/products/sputtering_targets 21

Energetic ion and surface interactions collision cascade 10-14 10-13 s thermal spike 10-13 10-12 s Fast diffusion fast cooling relaxation 22 Jari Koskinen, Kts. Aalto simulaatio University 2016

Sputtering yield 23

Sputter yield and sublimation energy 24

Sputter yield angle dependence and energy distribution 25

Sputter yield angle dependence and energy distribution 26

Sputter yield angle dependence and energy distribution 27

Contents Plasma Ion surface interactions Film growth mechanisms Different PVD methods Commercial PVD coatings Scale up 28

PVD (Physical Vapour Deposition) Material from solid or gas Plasma Energetic ions hit surface Ions and neutrals grow the film https:// www.youtube.co m/watch? v=lre5eqx9ofo www.iap.tuwien.ac.at/www/opt/images/parasol.jpg

PVD growth process Ion energy E i 10-1000 ev Surface temperature -190 C - 500 C (normally < 200 C) incidence angle Ion density Gas pressure Substrate surface 30 - Chemistry - Impurities - Topography

Competition of growing crystals Handbook of Deposition Technologies for Films and Coatings - Science, Applications and Technology (3rd Edition) Edited by: Martin, Peter M. 2010 William Andrew Publishing Sivu 31

Coating structure and plasma parameters slow hot fast cold 3/8/16 32

Modified Thorton diagram A. Anders, Thin Solid Films 518 (2010) 4087 4090 Sivu 33

Subplantation Sivu 34

Subplantation Sivu 35 Schematic diagram of densification by subplantation. A fraction of the incident ions penetrate the film and densify it, the remainder end up on the surface to give thickness growth.

Subplantation and experiments -Carbon Sivu 36

Subplantation Sivu 37

evolution of roughness Fig. 2. Schematic of roughness variation with film thickness in a general case. At first, the films consist of a series of islands where the new phase has nucleated, and the roughness increases quickly. Then the roughness peaks and decreases as the islands coalesce to form a closed, continuous film. The third stage consists of a constant roughness for epitaxial films. Finally, the roughness increases gradually above a roughening transition. The smoothness of tetrahedral amorphous carbon Diamond and Related Materials, Volume 14, Issues 3-7, March-July 2005, Pages 913-920 C. Casiraghi, A.C. Ferrari, J. Robertson

Stress Control Gas pressure /temperature Tensile stress due to collapsing of voids Higher temperature annealing of structure low stress Compressive stress subplantation 3/8/16 39

Compressive stress f FD = conc. of Frenkel defects f Ar = conc. of argon ΔΩ FD = volume change due to Frenkel defects ΔΩ Ar = volume change due to argon entrapped 3/8/16 40

Tensile stress 3/8/16 41

Ion beam nano roughening Enhanced adhesion 42

Contents Plasma Ion surface interactions Film growth mechanisms Different PVD methods Commercial PVD coatings Scale up 43

PVD methods PVD Sputtering Evaporation Diode Magnetron Ion beam Triode Resistive Arc Inductive e-beam Radio freq. Pulsed cathode DC sputtering Pulsed DC Balanced Unbalanced Balanced Unbalanced Filtered Non-filtered Steered Random

Ion beam sputtering Kaufman http:// www.youtube.com/ watch?v=ibcr- B258J8&NR=1

Surface coating methods more details

PVD methods

Electron beam evaporation Tyhjiöhöyrystys

Ion plating

Sputtering 50

Magnetron-sputtering Jari Koskinen, Lähde: Aalto Angstrom University Sciences, 2016 Inc.

Sputtering Principles of Sputtering animation Sputtering process, commercial Sputtering on Si wafers 52

Unballaced magnetron sputtering Magnetron-laitteisto

Closed field magnetron sputtering Magnetron-laitteisto

PVD-pinnoitin

Pulsed Plasma Diffusion

HIPIMS denser films

Reactive sputtering

Reactive sputtering

Reactive sputtering

Reactive sputtering

Reactive sputtering

Reactive sputtering

Arc discharge deposition Arc discharge video

Arc disharge cathode spot www.shm-cz.cz/files/schema01.jpg

Arc discharge process arc current concentrated into filaments arcs intense electron emission intense ion emission due to electron current ( atoms/electrons 1/100) ionization of atoms formation of plasma flow of ions to cathode intense sputtering of atoms 10 6-10 8 A/m 2 overlapping thermal spikes materials is melted and sublimated in cathode spots cathode spots move randomly or could be steered by using magnets electons ionize vapor and create more electrons increase of current ions accelerate due to potential difference in plasma due to multiple collisions with fast electrons macro particles (up to 10 µm diam.i are formed Timko, Nordlund simulations http://prb.aps.org/ supplemental/prb/v81/ i18/e184109

Filtered arc

Three types of bonding of carbon atoms sp 3 - Four string σ bonds in tetraedric directions sp 2 - Two σ bonds in plane - One weekπ bond ( non localised electron- conductivity) sp 1 - Two σ linear bonds - Two week π bonds (non localised electrons- conductivity)

Carbon structures- allotropies a diamond b graphite c lonsdalite (hex diam.) d fullerene 60C e fullerene 540C f fullerene 70C g amorphous carbon h carbon nano tube

Carbon Carbon has 3 hybridised bondings sp 3, sp 2, sp 1 sp 3 bondings form four equal carbon-carbon bonds producing tetrahedral structure of diamond Graphite has three sp 2 hybrid orbitals in plane 74

Diamond-like carbon (DLC) Various forms of C-H alloys presented in a ternary phase diagram DLC is a metastable form of amorphous carbon DLC films have a mixed sp 3 / sp 2 structure with different sp 3 and sp 2 proportions depending on deposition technique and parameters 75

76

Properties of ta-c as function of E i Sivu 77

Composition, effect to properties Composition as a function of deposition parameters, nitrogen composition (partial pressure of N2) Sivu 78

Pulsed laser deposition PLD high ionization evaporation of any material also in reactive gas stoichimetry of target to the surbstrate good control of depostion rate expensive lasers slow depostion rate not yet in industrial level http://www.youtube.com/watch_popup?v=g9rm4qhbnl0&vq=medium#t=19

E i as a function of laser pulse energy Sivu 80

Multilayer coatings TiAlN-multilayer

Ultrahard nanocomposte coatings - single layer At least two immiscible materials - nano-crystalline and amorphous Crystal growth limited by segregation of other phase in grain boundary Smaller crystal size -> higher hardness Typical: - nc-men/ nitride - nc-men/metal 82

Contents Plasma Ion surface interactions Film growth mechanisms Different PVD methods Commercial PVD coatings Scale up 83

PVD coatings - commercial TiAlN-multilayer Platit coatings Coating guide http://www.platit.com/coating Barlzers coatings http://www.oerlikon.com/balzers/com/en/coating-guideoverview/ Hauzer Techno Coating http://www.hauzertechnocoating.com/en/

DUPLEX- coating plasmanitrading + PVD-coating

Contents Plasma Ion surface interactions Film growth mechanisms Different PVD methods Commercial PVD coatings Scale up 86

Large volumes, up scaling Hear reflecting, self cleaning, photo voltaic /www. www.vonardenne.biz/

New emerging PVD methods vacuum polymer deposition (VPD) high-power pulsed magnetron sputtering (HPPMS or HIPIMS) filtered cathodic arc deposition glancing angle deposition (GLAD).